图书馆主页
数据库简介
最新动态
联系我们



返回首页


 刊名字顺( Alphabetical List of Journals):

  A|B|C|D|E|F|G|H|I|J|K|L|M|N|O|P|Q|R|S|T|U|V|W|X|Y|Z|ALL


  检 索:         高级检索

期刊名称:PLASMA PROCESSES AND POLYMERS

ISSN:1612-8850
出版频率:Monthly
出版社:WILEY-V C H VERLAG GMBH, POSTFACH 101161, WEINHEIM, GERMANY, 69451
  出版社网址:http://onlinelibrary.wiley.com/
期刊网址:http://onlinelibrary.wiley.com/journal/10.1002/(ISSN)1612-8869
影响因子:3.872
主题范畴:PHYSICS, APPLIED;    PHYSICS, FLUIDS & PLASMAS;    PHYSICS, CONDENSED MATTER;    POLYMER SCIENCE

期刊简介(About the journal)    投稿须知(Instructions to Authors)    编辑部信息(Editorial Board)   



About the journal

Plasma Processes and Polymers is THE interdisciplinary journal on low-temperature plasma sources and processes operating at pressures ranging from partial vaccum to atmospheric. The critically reviewed journal covering all aspects of state-of-the-art in low-temperature plasma science presented in various categories.

Plasma Processes and Polymers publishes an attractive mixture of Reviews, Feature Articles, Full Papers, Communications, Book Reviews, Conference Reports, Essays and Plasma News.

In 2006 Plasma Processes and Polymers has received a brilliant first Impact Factor of 2.846 (ISI 2005). As a new entry the journal direcly entered the top 10 not only of Polymer Science but also of three Physics categories it is listed in. This is a further proof that Plasma Processes and Polymers is on the way to be one of the leading journals in its field.

Readership

Materials scientists, physicists, chemists, biologists, engineers, health scientists, physicians - both in academia and industry

Keywords

Coatings, cold plasma, discharges, etching, plasma deposition, plasma diagnostics, plasma enhanced chemical vapour deposition, plasma initiated polymerization, semiconductors, surface modification, journal, online journal, Wiley InterScience, Plasma processes, Polymers

Abstracting & Indexing Information

  • Cambridge Scientific Abstracts (CSA/CIG)
  • Chemical Abstracts Service/SciFinder (ACS)
  • Chemistry Citation Index?(Thomson ISI)
  • ChemWeb (ChemIndustry.com)
  • COMPENDEX (Elsevier)
  • CSA Technology Research Database (CSA/CIG)
  • Current Contents?Physical, Chemical & Earth Sciences (Thomson ISI)
  • INSPEC (IET)
  • Journal Citation Reports/Science Edition (Thomson ISI)
  • Materials Science Citation Index?(Thomson ISI)
  • Polymer Library (Rapra)
  • Science Citation Index Expanded?(Thomson ISI)
  • SCOPUS (Elsevier)

 

Cover image for Vol. 7 Issue 8


Instructions to Authors


Editorial Board
Editors-in-Chief
Riccardo d´Agostino(University of Bari, Italy)
Pietro Favia(University of Bari, Italy)
Christian Oehr(Fraunhofer Institute for Interfacial Engineering and Biotechnology, Stuttgart, Germany)
Michael R. Wertheimer(École Polytechnique de Montréal, Canada)
International Advisory Board
Farzaneh Arefi-Khonsari (Ecole Nationale Supérieure de Chimie de Paris, France)
Hana Barankova (Uppsala University, Sweden)
Hynek Biederman (Charles University, Prague, Czech Republic)
Gheorghe Dinescu (Low Temperature Plasma Physics Laboratory, Bucharest, Romania)
Ellen R. Fisher (Colorado State University, Fort Collins USA)
Francesco Fracassi (University of Bari, Italy)
Karen K. Gleason (MIT, Cambridge, USA)
Agnes Granier (University of Nantes, France)
Hans J. Griesser, (University of South Australia, Mawson Lakes, Australia)
Ants Haljaste (University of Tartu, Estonia)
Dirk Hegemann (EMPA, St. Gallen, Switzerland)
Andreas Holländer (Fraunhofer Institute for Applied Polymer Science, Golm, Germany)
En-Tang Kang (National University of Singapore)
Ulrich Kogelschatz (Hausen, Switzerland)
Masuhiro Kogoma (Sophia University, Tokyo, Japan)
Mark Kushner (Iowa State University, Ames, USA)
Jae Koo Lee (Pohang University of Science and Technology, South Korea)
Gottlieb S. Oehrlein (University of Maryland, College Park, USA)
Francois Rossi (Joint Research Center of European Commission, Ispra, Italy)
Yvan Segui (Universite Paul-Sabatier, Toulouse, France)
Mark Strobel (3M, St. Paul, USA)
M.C.M. van de Sanden (Eindhoven University of Technology, Netherlands)
Kunihide Tachibana (Kyoto University, Japan)
Victor N. Vasilets, (Russian Academy of Sciences, Moscow, Russia)
Jörg Winter (Ruhr-University Bochum, Germany)


 返回页首 


邮编:430072   地址:中国武汉珞珈山   电话:027-87682740   管理员Email:
Copyright © 2005-2006 武汉大学图书馆版权所有