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期刊名称：AMERICAN JOURNAL OF CLINICAL DERMATOLOGY ISSN： 1175-0561 出版频率： Bi-monthly 出版社： ADIS INT LTD, 5 THE WAREHOUSE WAY, NORTHCOTE, NEW ZEALAND, AUCKLAND, 0627   出版社网址： http://www.medscape.com/public/publications 期刊网址： http://www.medscape.com/viewpublication/16031 影响因子： 7.403 主题范畴： DERMATOLOGY 期刊简介(About the journal)    投稿须知(Instructions to Authors)    编辑部信息(Editorial Board)    About the journal A unique forum for expert evaluation and opinion, the American Journal of Clinical Dermatology brings you the very latest information on rational therapy and effective patient management in dermatology. Invited, independent review articles from key international experts help to separate the facts from fiction and aid informed use of an ever expanding armamentarium of treatment options. Treatment reviews also bring you the most up-to-date thinking on disease pathogenesis and diagnosis. Journal content is further enhanced by our unique authoritative, comprehensive and focused Adis Drug Evaluations - evaluating and defining pharmacological properties, therapeutic efficacy, and place in therapy of both new and established dermatological treatments. Written by a team of inhouse writers and reviewed by a panel of external experts, each review offers the reader a complete synthesis of the available data. Instructions to Authors Submisson information  Website: http://www.editorialmanager.com/adis/ Editorial Board Editorial Board D. Abeck, Munich, Germany T. Alster, Washington DC, USA K.E. Andersen, Odense, Denmark F. Belli, Milan, Italy E. Berardesca, Rome, Italy C.J. Cockerell, Dallas, TX, USA P.R. Cohen, Houston, TX, USA M. Duvic, Houston, TX, USA P. Elsner, Jena, Germany V. Falanga, Providence, RI, USA E.R. Farmer, Norfolk, VA, USA F. Gasparro, Philadelphia, PA, USA B. Giannotti, Florence, Italy A. Gottlieb, New Brunswick, NJ, USA C.E.M. Griffiths, Manchester, England C.W. Hanke, Carmel, IN, USA R.J. Hay, London, England A. Khachemoune, New York, NY, USA A.M. Kligman, Philadelphia, PA, USA H.C. Korting, Munich, Germany M. Lebwohl, New York, NY, USA R.M. Mackie, Glasgow, Scotland R. Marks, Cardiff, Wales P. Morel, Paris, France U. Mrowietz, Kiel, Germany J.P. Ortonne, Nice, France A.S. Paller, Chicago, IL, USA C. Paniago, Brasilia, Brazil T.J. Phillips, Boston, MA, USA G. Pierard, Liege, Belgium N.S. Scheinfeld, New York, NY, USA N. Shear, Toronto, ONT, Canada S. Shuster, Framingham, England H. Tagami, Sendair, Japan J.M. Weinberg, New York, NY, USA W. Westerhof, Amsterdam, The Netherlands R.G. Wheeland, Tucson, AZ, USA L.T. Zane, San Francisco, CA, USA