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期刊名称：REVIEWS IN CHEMICAL ENGINEERING ISSN： 0167-8299 版本： SCI-CDE 出版频率： Bi-monthly 出版社： WALTER DE GRUYTER GMBH, GENTHINER STRASSE 13, BERLIN, GERMANY, D-10785   出版社网址： http://www.angelfire.com/IL/FREUND 期刊网址： http://www.hotbot.com/default.asp?prov=Google&dfi=angelfire.com&query=REVIEWS%20IN%20CHEMICAL%20ENGINEERING%20 影响因子： 6.299 主题范畴： ENGINEERING, CHEMICAL 期刊简介(About the journal)    投稿须知(Instructions to Authors)    编辑部信息(Editorial Board)    About the journal Reviews in Chemical Engineering The main aim of Reviews in Chemical Engineering is to develop new insights and to promote interest and research activity in chemical engineering and applied chemistry, as well as the application of new developments in these areas. The journal publishes authoritative articles of limited scope by leading chemical engineers, applied scientists and mathematicians. Long articles which review an entire field are also occasionally solicited. Because of the broad interest now shown in chemical problems which previously had a more limited appeal, Reviews in Chemical Engineering is sure to play a significant role in the growth of the field as a whole. Instructions to Authors These instructions are to help you prepare a manuscript that is suitable for submission to Reviews in Chemical Engineering. Manuscripts for Reviews in Chemical Engineering may be submitted to any of the editors, preferably to the author¡¯s regional editor. Five copies of the manuscripts should be submitted along with a diskette copy (preferably Word for Windows, PC). A short Abstract (maximum length 200 words) is required for all papers. Authors should use the International System of Units and their standard abbreviations. Your manuscript should be typed double-spaced, with the text either justified or flush left. Tables must have a short heading at the top and numbered with Arabic numerals. Figures must be clearly identified with captions, on separate pages with clear indications in the text where the figures are to be placed. Photographs should be sharp black and white prints with high contrast (glossy). Identify clearly where each photograph is to be placed in the text, and mark * to indicate top. Equations (see example below) should be preceded and followed by a blank line. If numbered, make sure that they are numbered consecutively. Equations should not be written by hand. Pages should be numbered at the bottom. References must be numbered consecutively in order of their appearance. Both authors are cited when there are two and "et al." is used to cite a publication having more than two authors. For example: "Barnes et al. (1969, 1971) and Walters and Townsend (1968) explored the effects ...". A complete list of references must be compiled at the end of the manuscript including the year of publication, title of the book, volume number, and complete pagination. Manuscripts will be sent for peer review, and accepted papers are subject to editing. A reprint order form will be sent with the page proofs, and must be returned with the corrected proofs. One copy of the journal and 25 reprints per article will be provided free of charge. Please indicate, with full address including telephone, fax, email, etc., the author to whom correspondence and the reprints are to be sent. Editorial Board Editors Neal R. Amundson and Dan Luss University of Houston Department of Chemical Engineering Houston, Texas 77004, USA N. Brauner Tel Aviv University Dept. of Fluid Membranes and Heat Transfer Faculty of Engineering 69978 Ramat Aviv, Israel Editorial Board Prof. J. Kost Dept. of Chemical Engineering Ben Gurion University Beer Sheva, 84105  Israel L. Gary Leal University of California Santa Barbara, CA 93106-5080  USA Eli Ruckenstein State University of New York Buffalo, NY 14260  U.S.A. Pablo G. Debenedetti Princeton University Princeton, New Jersey 08544-5263  USA Patrick L. Mills DuPont Central Research & Development Experimental Station, Wilmington, DE  19880  USA  William B. Russel Princeton University Princeton, NJ 08544  U.S.A. Thomas F. Edgar University of Texas Austin, Texas 78712  U.S.A.  Manfred Morari Automatic Control Laboratory ETH Zentrum, ETL 129 CH-8902 Zurich, Switzerland John H. Seinfeld California Institute of Technology Pasadena, CA, 91125  U.S.A. Gerhart Eigenberger Institut fuer Chemische Verfahrenstechnik University of Stuttgart,  D-70199 Stuttgart, Germany  M. Narkis Dept. of Chemical Engineering Technion-IIT, Haifa 32000 Israel  Jeffrey J. Siirola Eastman Chemical Company Kingsport, Tennessee 37662 U.S.A. Gilbert F. Froment University of Ghent Rijksuniversiteit, Ghent Belgium  O.E. Potter Monash University Clayton 3168, Victoria Australia  John Villadsen Instituttet for Kemiteknik Denmarks Tekniske  Hojskole, Lyngby, Denmark Prof. J.B. Joshi Dept. of Chemical Technology University of Mumbai Matunga, Mumbai-400 019 India  John A. Quinn University of Pennsylvania Philadelphia, PA  19104  U.S.A. Arthur W. Westerberg Carnegie-Mellon University Pittsburgh, PA  15213  U.S.A. Yannis G. Kevrekidis Princeton University Princeton, New Jersey 08544-5263  USA  Robert C. Reid Massachusetts Institute of Technology Cambridge, MA 02139  U.S.A.