期刊名称：PLASMA CHEMISTRY AND PLASMA PROCESSING
 期刊简介(About the journal)
投稿须知(Instructions to Authors)
编辑部信息(Editorial Board)
About the journal
Plasma Chemistry and Plasma Processing
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Plasma Chemistry and Plasma Processing is an international journal for the publication of original papers on fundamental research and new developments in plasma chemistry and plasma processing. The broad coverage of experimental, analytical and numerical studies includes both non-equilibrium (`cold') and equilibrium (`hot') plasmas. Pertinent diagnostic studies are also encouraged. Typical subject areas are: etching, deposition of thin films and protective coatings, annealing, polymerization, preparation of amorphous and crystalline materials, surface modification, techniques for making electronic devices, and techniques for analytical chemistry. Other topics of interest include volume reactions in inorganic and organic systems, thermal plasma synthesis, metallurgy, fuming, coal gasification and desulfurization, spheroidization, spraying, surfacing and modeling of plasma reactors. |
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Indexing/Abstracting Services
Plasma Chemistry and Plasma Processing is indexed/abstracted in Chemical Abstracts; INSPEC Information Services; METADEX (Metals Abstracts); Referativnyi Zhurnal
Instructions to Authors
- Manuscripts should be sent to either one of the Editors:
Professor E. Pfender
University of Minnesota
Department of Mechanical Engineering
125 Mechanical Engineering
111 Church Street S.E.
Minneapolis, Minnesota 55455
or
Prof. Dr. S. Veprek
Institut f¨¹r Chemie der Informationsaufzeichnung
Technische Universität M¨¹nchen
Lichtenbergstrasse 4
D-85747 Garching be M¨¹nchen
Germany
- Submission is a representation that the manuscript has not been published previously and is not currently under consideration for publication elsewhere. A statement transferring copyright from the authors (or their employers, if they hold the copyright) to Plenum Publishing Corporation will be required before the manuscript can be accepted for publication. The Editor will supply the necessary forms for this transfer. Such a written transfer of copyright, which previously was assumed to be implicit in the act of submitting a manuscript, is necessary under the U.S. Copyright Law in order for the publisher to carry through the dissemination of research results and reviews as widely and effectively as possible.
- Type double-spaced, and submit the original and two copies (including copies of all illustrations and tables).
- An abstract, preferably no longer than 150 words, is to be provided, together with a list of key words, placed directly below the abstract.
- Illustrations (photographs, drawings, diagrams, and charts) are to be numbered in one consecutive series of Arabic numerals. The captions for illustrations should be typed on a separate page. Photographs should be large, glossy prints showing high contrast. Drawings should be prepared with india ink, and the lettering of graphs must be large, clear, and "open" so that letters and numbers do not fill when reduced for publication. Either original drawings or good-quality photographic prints are acceptable. Identify figures on the back with the author¡®s name and number of the illustration.
- Tables should be numbered (preferably with Roman numerals) and referred to by number in the text. Each table should be typed on a separate page.
- If a large amount of experimental data is to be published and if the data are essential to a meaningful reading of the paper, a table can be published in miniprint. This can be accomplished by submitting for each journal page a glossy print on 8 1/2 x 11 in. paper in which the data are reduced in size by a factor between two and three. The final reduction can be minimized if the table is arranged to conform to the same width-to-length ratio as a printed journal page, i.e., approximately 2:3 (actual measurements are 27 x 42 picas, or 11.4 x 17.7 cm). Since the glossy print will be treated in the same manner as a figure with only the title set in print, it is essential that the photographic print have clear, dark type. Identify prints on the back with the author¡®s name and number of the table.
- References should be listed numerically at the end of the paper. Use the appropriate superscript numeral in parentheses for citation in the text.
- Footnotes should be numbered using a separate set of numerals and should be typed at the bottom of the page to which they refer. Place a line above the footnote, so that it is set off from the text. Use the appropriate superscript numeral without parentheses for citation in the text.
- The publication of unsmoothed experimental data is preferred. Tabulation of excessive amounts of data can be avoided by an analytical expression and the deviations.
- In general, the style of the manuscript should follow the recommendations of the American Institute of Physics in its Style Manual. The Editors, upon accepting a manuscript, reserve the right to introduce style changes consistent with the overall style of the journal.
- After a manuscript has been accepted for publication and after all revisions have been incorporated, manuscripts should be submitted to the Editor¡®s Office as hard copy accompanied by electronic files on disk. Label the disk with identifying information -- software, journal name, and first author¡®s last name. The disk must be the one from which the accompanying manuscript (finalized version) was printed out. The Editor¡®s Office cannot accept a disk without its accompanying, matching hard-copy manuscript.
- The journal makes no page charges. Reprints are available to authors, and order forms with the current price schedule are sent with proofs.
Editorial Board
Editor:
Emil Pfender
Dept. of Mechanical Enginering, University of Minnesota, Minneapolis, USA
Stan Vepřek
Institute for Chemistry of Inorganic Materials, Technical University of Munich, Germany
Editorial Board:
K. Akashi, Science University of Tokyo, Japan
M. Boulos, Universit¨¦ de Sherbrooke, QC, Canada
R. Boxman, Tel Aviv University, Israel
Xi Chen, Tsinghua University, Beijing, PR of China
P. Fauchais, Universit¨¦ de Limoges, France
J. Fincke, Lockheed Idaho Technologies Co., Idaho Falls, ID
D.L. Flamm, Microtechnology Analysis Group, Berkeley, CA
S. Girshick, University of Minnesota, Minneapolis
A. Gnedovets, A.A. Baikov Institute of Metallurgy, Russian Academy of Sciences, Moscow, Russia
Ch. Hollenstein, Swiss Federal Institute of Technology, Lausanne, Switzerland
R. Knight, Drexel University, Philadelphia, PA
U. Kogelschatz, ASEA Brown Boveri, Baden, Switzerland
J. Lowke, CSIRO, Division of Applied Physics, Lindfield, Australia
O. Matsumoto, Aoyama Gakuin University, Tokyo, Japan
J. Mostaghimi, University of Toronto, Canada
J. Musil, Academy of Sciences of the Czech Republic, Prague, Czech Republic
J. Perrin, Ecole Polytechnique, Palaiseau Cedex, France
L. Polak, Russian Academy of Sciences, Moscow, Russia
I. Pollo, Technical University Lublin, Poland
D. Schram, Eindhoven University of Technology, The Netherlands
O. Solonenko, Institute of Thermal Physics, Novosibirsk, Russia
M. Ushio, Welding Research Institute, Osaka University, Japan
H. Wilhelmi, RWTH Aachen, Germany
R. Winkler, University of Greifswald, Germany
C.K. Wu, Chinese Academy of Sciences, Beijing, PR of China T. Yoshida, University of Tokyo, Tokyo, Japan
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