期刊名称：CHEMICAL VAPOR DEPOSITION
 期刊简介(About the journal)
投稿须知(Instructions to Authors)
编辑部信息(Editorial Board)
About the journal
Chemical Vapor Deposition (CVD) publishes Reviews, Short Communications and Full Papers on all aspects of chemical vapor deposition and related technologies, along with other articles presenting opinion, news, conference information and book reviews.
All papers are peer-reviewed in the usual Advanced Materials quality.
Chemists, physicists and engineers whose publications on chemical vapor deposition have in the past been spread over journals covering inorganic chemistry, materials chemistry, organometallics, applied physics and semiconductor technology, thin films and ceramic processing now have a unified forum for their work.
Instructions to Authors
The Journal
CHEMICAL VAPOR DEPOSITION (CVD) is an international peer-reviewed journal dealing with the chemistry, physics, and engineering of chemical vapor deposition and related technologies, and is published in English. An interdisciplinary approach from authors is encouraged. The chemistry and physics of metal-, semiconductor-, and ceramic-CVD precursors forms a core area of interest, as do the physical parameters of the process itself, and the characteristics and performances of the deposited materials. CVD publishes stringently refereed Reviews, Full Papers, and Short Communications, along with Essays, news items, correspondence, book reviews, and a conference calendar. CVD is published six times a year as a section in Advanced Materials.
Submission of Manuscripts
Manuscripts should be submitted to:
Chemical Vapor Deposition
Prof. Michael L. Hitchman
Department of Pure and Applied Chemistry
University of Strathclyde
295 Cathedral Street
Glasgow G1 lXL (UK)
fax: (+44) 141 548 4822
phone: (+44) 141 553 4189
e-mail: m.l.hitchman@strath.ac.uk
Authors are requested to submit four copies of the manuscripts. Originals plus three copies of all illustrations are required.
A diskette containing the text, references, figure captions, and tables should be sent to the editor upon notification of acceptance of a manuscript for publication. The version on the diskette should be the revised version, if applicable. The software and hardware used should be specificd (including the number of the version of the word-processing program). Please also save the text file in RTF format. Figures should be supplied in electronic form if possible (in addition to original printouts), preferably as high-resolution TIF or EPS files.
Language: Papers must be written in clear and correct English.
Reprints can be ordered when the proofs are returned to the publisher. Reprint rates are also available from the Editorial Office on request.
Manuscript Styling
Authors are encouraged to consult recent issues of the journal for examples of format.
Manuscripts must be typed double spaced (including footnotes, references, tables, and legends). The first names, other initials, and surnames of all authors should be given along with full postal addresses, fax numbers and e-mail addresses. The correspondence author should be designated by a star. SI units should be used.
IUPAC nomenclature should be used when naming compounds. A full guide to nomenclature and terminology can be found at the IUPAC web site.
Artwork should be marked individually with the author's name and figure number. Multi-part figures should be avoided wherever possible. Figure legends should be part of the text manuscript. Color figures are welcome. Authors are expected to make a contribution towards the extra costs associated with color reproduction (the costs are indicated on acceptance of the manuscript). Photographs and figures with gray tones should be provided as glossy prints or in electronic form as a TIF or EPS file with the highest resolution possible. Images in electronic form must be accompanied by a printout. For further information see the guidelines to submission of graphical material.
Tables should be provided in a camera-ready form with a text and symbol size that will result in text ca. 1.8 mm high when the table is reduced to a width of 81 mm. Tables should have just three horizontal lines (two marking the header, one at the base) and no vertical lines. Footnotes in tables are denoted [a], [b], [c], etc.
References: Only papers that are published or in press should be referenced. References should be entered in the text[1] as superscripts in square brackets.[2-6] The automatic footnote option provided by many text programs should not be used. Journal titles should be abbreviated according to the Chemical Abstracts Service Source Index (CASSI). At the end of the manuscript the references should be listed as in the following examples:
Journals:
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[1] |
D. L. Schulz, T. J. Marks, Adv. Mater. 1994, 6, 719. |
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[2] |
H. Fujimori, K. Osada, Chem. Lett. 1994, 456. |
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[3] |
A. C. Jones, C. R. Whitehouse, J. S. Roberts, Chem. Vap. Deposition 1995, 1, 65. |
Books:
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[4] |
Chemical Vapor Deposition: Principles and Applications (Eds: M. L. Hitchman, K. F. Jensen), Academic Press, London 1993. |
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[5] |
H. G. Elias, An Introduction to Polymer Science, 2nd ed., WILEY-VCH, Weinheim 1997. |
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[6] |
W. Gladfelter, in The Chemistry of Metal CVD (Eds: T. T. Kodas, M. Hampden-Smith), VCH, Weinheim 1994. |
Note that journal and book titles should be in italics, the year of publication in boldface type, and the volume number of journals in italics.
Categories of Contribution
Review articles should not exceed 25 typewritten pages and can include up to 20 camera-ready display items (figures and tables). Reviews are peer-reviewed and give a critical overview of a particular field, providing the reader with an appreciation of the importance of the work, a summary of recent developments, a balanced discussion of problems and progress, and well-selected literature coverage. The manuscript can be divided up into appropriate sections. A passport-type photo and a short summary of the career to-date of the correspondence author(s) (maximum three) should be included. An abstract and five keywords should be given at the top of the manuscript. Reviews are usually written on invitation. Other authors wishing to submit a Review article should discuss the article with the editors at an early stage.
Full papers report peer-reviewed comprehensive details of completed studies, whether experimental or theoretical, and have well-developed discussions, background information, and literature coverage. An abstract of up to 100 words should describe the main results and conclusions of the paper. The manuscript can be divided into sections in the following order: introduction, results, discussion, conclusions, experimental, references. Full Papers should be limited to 15 typewritten pages plus no more than 8 display items (figures and tables). Five keywords should be given at the top of the manuscript.
Short communications are unsolicited, peer-reviewed, short reports of outstanding novel findings which have important implications for specialists in the field. There should be no section headings except for an Experimental section (where appropriate) at the end of the article before the references. The first paragraph should summarize the reasons for undertaking the work, and the main conclusions that can be drawn (there should be no abstract). The final paragraph should summarize the major findings of the paper. Short Communications should be limited to 6 typewritten pages plus references and no more than 4 display items (figures and tables).
CVD Forum contains short news items from industry and academia, correspondence, and product and conference information. Single-page manuscripts with or without a display item are welcome.
Journal/Software/Book Reviews are usually written on invitation, but suggestions for products/topics/reviewers are always welcome.
Editorial Board
| Editors: |
Michael L. Hitchman
Esther Levy
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| Editorial Advisory Board: |
S. E. Alexandrov, St. Petersburg
M. Allendorf, Sandia Natl. Labs.
G. A. Battiston, Padua
C. Bernard, Grenoble
T. M. Besmann, Oak Ridge Natl. Lab.
W. G. Breiland, Sandia Natl. Labs.
J.-O. Carlsson, Uppsala
K. H. Dahmen, Tallahassee
J. G. Eden, Illinois
A. Figueras, Barcelona
R. A. Fischer, Bochum
W. L. Gladfelter, Minnesota
M. Hammond, SI Diamond Inc.
M. J. Hampden-Smith, New Mexico
H. E. Hintermann, Ins
P. John, Heriot Watt
H. Jürgenson, AIXTRON
B. Lux, Vienna
T. Mäntyl? Tampere
T. Marks, Northwestern
B. S. Meyerson, IBM
R. L. Moon, Hewlett Packard
S. Oda, Tokyo
W. Richter, Berlin
G. B. Stringfellow, Utah
G. Wahl, Braunschweig
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