期刊名称:JOURNAL OF NANOMATERIALS

ISSN:1687-4110
出版频率:Irregular
出版社:HINDAWI LTD, ADAM HOUSE, 3RD FLR, 1 FITZROY SQ, LONDON, ENGLAND, W1T 5HF
  出版社网址:http://www.hindawi.com/
期刊网址:http://www.hindawi.com/journals/jnm/
影响因子:2.986
主题范畴:NANOSCIENCE & NANOTECHNOLOGY;    MATERIALS SCIENCE, MULTIDISCIPLINARY

期刊简介(About the journal)    投稿须知(Instructions to Authors)    编辑部信息(Editorial Board)   



About the journal

The overall aim of the Journal of Nanomaterials is to bring science and applications together on nanoscale and nanostructured materials with emphasis on synthesis, processing, characterization, and applications of materials containing true nanosize dimensions or nanostructures that enable novel/enhanced properties or functions. It is directed at both academic researchers and practicing engineers. Journal of Nanomaterials will highlight the continued growth and new challenges in nanomaterials science, engineering, and nanotechnology, both for application development and for basic research. All papers should emphasize original results relating to experimental, theoretical, computational, and/or applications of nanomaterials ranging from hard (inorganic) materials, through soft (polymeric and biological) materials, to hybrid materials or nanocomposites.

The most recent Impact Factor for Journal of Nanomaterials is 0.688 according to 2008 Journal Citation Reports released by Thomson Reuters (ISI) in 2009.

The articles of Journal of Nanomaterials are indexed/reviewed in the following databases/resources:

  • Academic Search Complete
  • ACM Guide to Computing Literature
  • Advanced Polymers Abstracts
  • Chemical Abstracts
  • ChemRefer
  • Corrosion Abstracts
  • CSA Technology Research Database
  • Current Abstracts
  • Current Contents/Engineering, Computing, and Technology
  • Current Contents/Physical, Chemical and Earth Sciences
  • Directory of Open Access Journals (DOAJ)
  • Engineered Materials Abstracts
  • Google Scholar
  • INSPEC
  • Journal Citation Reports/Science Edition
  • Materials Research Database with METADEX
  • Materials Science Citation Index
  • METADEX
  • Open J-Gate
  • Polymer Library
  • Referativnyi Zhurnal (VINITI)
  • Science Citation Index Expanded
  • Scopus
  • Solid State and Superconductivity Abstracts
  • Technology and Management (TEMA Database)
  • World Ceramics Abstracts

Instructions to Authors

Submission

Manuscripts should be submitted by one of the authors of the manuscript through the online Manuscript Tracking System. Regardless of the source of the word-processing tool, only electronic PDF (.pdf) or Word (.doc, .docx, .rtf) files can be submitted through the MTS. There is no page limit. Only online submissions are accepted to facilitate rapid publication and minimize administrative costs. Submissions by anyone other than one of the authors will not be accepted. The submitting author takes responsibility for the paper during submission and peer review. If for some technical reason submission through the MTS is not possible, the author can contact jnm@hindawi.com for support.

 

Terms of Submission

Papers must be submitted on the understanding that they have not been published elsewhere (except in the form of an abstract or as part of a published lecture, review, or thesis) and are not currently under consideration by another journal published by Hindawi or any other publisher. The submitting author is responsible for ensuring that the article's publication has been approved by all the other coauthors. It is also the authors' responsibility to ensure that the articles emanating from a particular institution are submitted with the approval of the necessary institution. Only an acknowledgment from the editorial office officially establishes the date of receipt. Further correspondence and proofs will be sent to the author(s) before publication unless otherwise indicated. It is a condition of submission of a paper that the authors permit editing of the paper for readability. All enquiries concerning the publication of accepted papers should be addressed to jnm@hindawi.com.

 

Peer Review

All manuscripts are subject to peer review and are expected to meet standards of academic excellence. Submissions will be considered by an associate editor and—if not rejected right away—by peer-reviewers, whose identities will remain anonymous to the authors.

 

Article Processing Charges

Journal of Nanomaterials is an open access journal. Open access charges allow publishers to make the published material available for free to all interested online visitors. For more details about the article processing charges of Journal of Nanomaterials, please visit the Article Processing Charges information page.

 

Units of Measurement

Units of measurement should be presented simply and concisely using System International (SI) units.

 

Title and Authorship Information

The following information should be included

 

Paper title

Full author names

Full institutional mailing addresses

Email addresses

Abstract

The manuscript should contain an abstract. The abstract should be self-contained and citation-free and should not exceed 150 words.

 

Introduction

This section should be succinct, with no subheadings.

 

Acknowledgments

All acknowledgments (if any) should be included at the very end of the paper before the references and may include supporting grants, presentations, and so forth.

 

References

Authors are responsible for ensuring that the information in each reference is complete and accurate. All references must be numbered consecutively and citations of references in text should be identified using numbers in square brackets (e.g., “as discussed by Smith [9]��? “as discussed elsewhere [9, 10]��?. All references should be cited within the text; otherwise, these references will be automatically removed.

 

Preparation of Figures

Each figure should be supplied in a separate electronic file. All figures should be cited in the paper in a consecutive order. Figures should be supplied in either vector art formats (Illustrator, EPS, WMF, FreeHand, CorelDraw, PowerPoint, Excel, etc.) or bitmap formats (Photoshop, TIFF, GIF, JPEG, etc.). Bitmap images should be of 300 dpi resolution at least unless the resolution is intentionally set to a lower level for scientific reasons. If a bitmap image has labels, the image and labels should be embedded in separate layers.

 

Preparation of Tables

Tables should be cited consecutively in the text. Every table must have a descriptive title and if numerical measurements are given, the units should be included in the column heading. Vertical rules should not be used.

 

Proofs

Corrected proofs must be returned to the publisher within 2-3 days of receipt. The publisher will do everything possible to ensure prompt publication. It will therefore be appreciated if the manuscripts and figures conform from the outset to the style of the journal.

 

Copyright

Open Access authors retain the copyrights of their papers, and all open access articles are distributed under the terms of the Creative Commons Attribution license, which permits unrestricted use, distribution and reproduction in any medium, provided that the original work is properly cited.

 

The use of general descriptive names, trade names, trademarks, and so forth in this publication, even if not specifically identified, does not imply that these names are not protected by the relevant laws and regulations.

 

While the advice and information in this journal are believed to be true and accurate on the date of its going to press, neither the authors, the editors, nor the publisher can accept any legal responsibility for any errors or omissions that may be made. The publisher makes no warranty, express or implied, with respect to the material contained herein.


Editorial Board

Editor-in-Chief

Michael Z. Hu, Oak Ridge National Laboratory, USA

Advisory Board

James H. Adair, Pennsylvania State University, USA
C. Jeffrey Brinker
, Sandia National Laboratories, USA
Taeghwan Hyeon
, Seoul National University, South Korea
Nathan Lewis
, California Institute of Technology, USA
Ed Ma
, Worcester Polytechnic Institute, USA
Alon V Mccormick
, University of Minnesota Minneapolis, USA
Gary L. Messing
, Pennsylvania State University, USA
Zhonglin Wang
, Georgia Institute of Technology, USA
Enge Wang
, nese Academy of Sciences Institute of Physics, China
Ching Ping Wong
, Georgia Institute of Technology, USA
N. Xu
, Nanjing University of Chemical Technology, China
Jackie Y. Ying
, Agency for Science, Technology and Research, Singapore

Associate Editors

Alan K. T. Lau, The Hong Kong Polytechnic University, Hong Kong
Xuedong Bai
, Chinese Academy of Sciences, China
Donald A. Bansleben
, Department of Homeland Security, USA
Theodorian Borca-Tasciuc
, Rensselaer Polytechnic Institute, USA
Christian Brosseau
, Université de Bretagne Occidentale, France
Siu Wai Chan
, Columbia University, USA
Sang-Hee Cho
, Kyungpook National University, South Korea
Chun Xiang Cui
, Hebei University of Technology, China
Ali Eftekhari
, Ohio Institute of Technology, USA
Claude Estournes
, Institut Carnot CIRIMAT, France
Alan Fuchs
, University of Nevada, Reno, USA
Lian Gao
, Chinese Academy of Sciences, China
Hongchen Chen Gu
, Shanghai Jiao Tong University, China
Michael Harris
, Purdue University, USA
Justin D. Holmes
, University College Cork, Ireland
Wanqin Jin
, Nanjing University of Technolog, China
Rakesh K. Joshi
, University of South Florida, USA
Do Kyung Kim
, Korea Advanced Institute of Science and Technology, South Korea
Burtrand Lee
, Clemson University, USA
Jun Li
, National University of Singapore, Singapore
Shijun Jun Liao
, South China University of Technology, China
Gong-Ru Lin
, National Taiwan University, Taiwan
J. -Y. Liu
, University of Missouri, St. Louis, USA
Jun Liu
, Pacific Northwest National Laboratory, USA
Songwei Lu
, PPG Industries, USA
Daniel Lu
, Henkel Corp., China
Sanjay R. Mathur
, University of Cologne, Germany
Nobuhiro Matsushita
, Tokyo Institute of Technology, Japan
Sherine Obare
, Western Michigan University, USA
P. Panine
, European Synchrotron Radiation Facility, France
Edward Andrew Payzant
, Oak Ridge National Laboratory, USA
Donglu Shi
, University Of Cincinnati, USA
Bohua Sun
, Cape Peninsula University of Technology, South Africa
Maryam Tabrizian
, McGill University, Canada
Theodore Tsotsis
, University of Southern California, USA
Xiaogong Wang
, Tsinghua University, China
Yong Wang
, Pacific Northwest National Laboratory, China
Michael S. Wong
, Rice University, USA
Ping Xiao
, University of Manchester, United Kingdom
Zhi-Li Xiao
, Northern Illinois University, USA
Doron Yadlovker
, RAFAEL Ltd, Israel
Kui Yu
, National Research Council, Canada


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