(2012年/4月)
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首页 |
书名 |
索书号 |
馆藏地点 |
书评 |
Statistical analysis of designed experiments : theory and applications / |
O212.6/T157/2009/Y |
文理馆外国教材中心 |
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Reactions at solid surfaces / |
O647.11/E73/2009/Y |
文理馆外国教材中心 |
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MALDI mass spectrometry for synthetic polymer analysis / |
O63/M433/2010/Y |
文理馆外国教材中心 |
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20th AIAA computational fluid dynamics conference 2011 : Honolulu, Hawaii, USA 27-30 June 2011.-v. 4 of 4 |
O351.2-532/A512c/2011,20th/V.4/Y |
文理馆外国教材中心 |
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20th AIAA computational fluid dynamics conference 2011 : Honolulu, Hawaii, USA 27-30 June 2011.-v. 3 of 4 |
O351.2-532/A512c/2011,20th/V.3/Y |
文理馆外国教材中心 |
|
20th AIAA computational fluid dynamics conference 2011 : Honolulu, Hawaii, USA 27-30 June 2011.-v. 2 of 4 |
O351.2-532/A512c/2011,20th/V.2/Y |
文理馆外国教材中心 |
|
20th AIAA computational fluid dynamics conference 2011 : Honolulu, Hawaii, USA 27-30 June 2011.-v. 1 of 4 |
O351.2-532/A512c/2011,20th/V.1/Y |
文理馆外国教材中心 |
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Fundamentals of incompressible fluid flow / |
O351.3/B115/2010/Y |
文理馆外国教材中心 |
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The thermodynamics of quantum yang mills theory : theory and applications / |
O413.3/H711/2011/Y |
文理馆外国教材中心 |
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Finite element method : fundamentals and applications / |
O241.82/D293f/2010/Y |
文理馆外国教材中心 |
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Numerical problems in solid state physics / |
O48/W136/2011/Y |
文理馆外国教材中心 |
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Advances in chromatography.-v. 48 |
O658.1/G453/2010/V.48/Y |
文理馆外国教材中心 |
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Solids far from equilibrium / |
O48/S686g/2011/Y |
文理馆外国教材中心 |
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Mathematical methods for optical physics and engineering / |
O43/G291/2011/Y |
文理馆外国教材中心 |
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Non-Hermitian quantum mechanics / |
O413.1/M714/2011/Y |
文理馆外国教材中心 |
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Interpreting quantum theories : the art of the possible / |
O413/R921/2011/Y |
文理馆外国教材中心 |
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Macromolecular crystallization and crystal perfection / |
O7/C512/2010/Y |
文理馆外国教材中心 |
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Light scattering, size exclusion chromatography, and asymmetric flow field flow fractionation : powe |
O657.3/P742/2011/Y |
文理馆外国教材中心 |
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Wave propagation in fluids : models and numerical techniques / |
O353.2/G964(2)/2010/Y |
文理馆外国教材中心 |
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Growth and characterization of ITO thin film by Magnetron Sputtering: ITO growth / |
O612.3/T926/2010/Y |
文理馆外国教材中心 |
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