期刊名称:APPLIED MATERIALS TODAY

ISSN:2352-9407
出版频率:Quarterly
出版社:ELSEVIER, RADARWEG 29, AMSTERDAM, NETHERLANDS, 1043 NX
  出版社网址:https://www.elsevier.com/zh-cn
期刊网址:https://www.journals.elsevier.com/applied-materials-today
影响因子:10.041
主题范畴:MATERIALS SCIENCE, MULTIDISCIPLINARY
变更情况:

期刊简介(About the journal)    投稿须知(Instructions to Authors)    编辑部信息(Editorial Board)   



About the journal

Applied Materials Today is a multi-disciplinary, rapid-publication journal focused on cutting edge applications of novel materials.

New materials discoveries have led to exciting fundamental breakthroughs. Materials research is now moving towards the translation of these scientific properties and principles to applied technologies. Applied Materials Todaycovers all aspects of materials application, spanning chemistry, physics, engineering, and biology: publishing high impact articles on novel electronic, optical, mechanical, and energy devices, as well as medicine, the environment and the impact on society.

Part of the Materials Today family, Applied Materials Today offers authors rigorous peer review, rapid decisions, and high visibility. The editors welcome comprehensive articles, short communications and reviews on topics including but not limited to:

  • Two dimensional materials
  • Wearable electronics
  • 3D printing/Additive manufacturing
  • Materials for energy
  • Functional materials
  • Materials synthesis
  • Nanomaterials and nanotechnology
  • Biomaterials and nanomedicine
  • Ramifications on society
  • Health and environmental impact
  • Research commercialization
  • Fundamental principles with a view to specific applications
  • Abstracting and Indexing

    • Emerging Sources Citation Index (ESCI)
    • Scopus

    Instructions to Authors

    All journal information and instructions compiled in one document (PDF) in just one mouse-click Author information pack

    • Types of article
    • Submission checklist
    BEFORE YOU BEGIN
    • Ethics in publishing
    • Declaration of interest
    • Submission declaration and verification
    • Use of inclusive language
    • Changes to authorship
    • Copyright
    • Role of the funding source
    • Open access
    • Submission
    PREPARATION
    • Peer review
    • Article structure
    • Essential title page information
    • Highlights
    • Abstract
    • Keywords
    • Artwork
    • Tables
    • References
    • Video
    • Supplementary material
    • RESEARCH DATA
    AFTER ACCEPTANCE
    • Online proof correction
    • Offprints
    AUTHOR INQUIRIES


    Instructions to Authors
    736582.pdf

    Editorial Board
    Editor-in-Chief

    M. Pumera

    University of Chemistry and Technology, Prague, Czech Republic
    Associate Editor

    M Daturi

    ENSICAEN - CNRS University of Caen, Caen, France

    C. Wu

    Chinese Academy of Sciences (CAS), Shanghai, China
    Editorial Board Members

    K. Ariga

    National Institute for Materials Science (NIMS), Tsukuba, Japan

    Z. Bao

    Stanford University, Stanford, California, USA

    T. Bender

    University of Toronto, Toronto, Ontario, Canada

    X. Cao

    University of Science and Technology Beijing, Beijing, China

    H.M. Cheng

    Chinese Academy of Sciences (CAS), Shenyang, China

    N. Cho

    Nanyang Technological University, Singapore, Singapore

    S. Cohen

    University of California at San Diego (UCSD), La Jolla, California, USA

    S. Eigler

    Chalmers University of Technology, Gothenburg, Sweden

    A. Escarpa

    Universidad de Alcalá, Alcalá de Henares, Spain

    A.F. Facchetti

    Northwestern University, Evanston, Illinois, USA

    L. Gang

    Ningbo Institute of Materials Technology and Engineering, Zhejiang, China

    J. Guan

    Wuhan University of Technology, Wuhan, China

    A. Hirsch

    Friedrich-Alexander-Universität Erlangen-Nürnberg, Erlangen, Germany

    J.X. Huang

    Northwestern University, Evanston, Illinois, USA

    H. Imahori

    Kyoto University, Kyoto, Japan

    K. Kalantar-zadeh

    UNSW Australia, Sydney, New South Wales, Australia

    L. Kian Ping

    National University of Singapore, Kent Ridge, Singapore

    K. Kostarelos

    University of Manchester, Manchester, England, UK

    C. S. Lee

    City University of Hong Kong, Kowloon, Hong Kong

    Y.H. Lee

    Sungkyunkwan University (SKKU), Suwon, The Republic of Korea

    X.-Y. Ling

    Nanyang Technological University, Singapore, Singapore

    J. Liu

    University of Surrey, Guildford, Surrey, UK

    J. Lou

    Rice University, Houston, Texas, USA

    H. Luo

    New Mexico State University, Las Cruces

    L. Mai

    Wuhan University of Technology, Wuhan, China

    J. Mano

    Universidade de Aveiro, Aveiro, Portugal

    A. D. Mohite

    Los Alamos National Laboratory, Los Alamos, New Mexico, USA

    P. Neuzil

    Northwestern Polytechnical University, Xi'an, China

    S. Pané i Vidal

    ETH Zürich, Zurich, Switzerland

    H. Peng

    Peking University, Beijing, China

    Z. Ren

    University of Houston, Houston, Texas, USA

    J.A. Rogers

    University of Illinois at Urbana-Champaign, Urbana, Illinois, USA

    E. Saiz Gutierrez

    Imperial College London, London, England, UK

    M. Terrones

    Pennsylvania State University, University Park, Pennsylvania, USA

    H. Wang

    China University of Mining and Technology, Xuzhou, China

    J. Wang

    University of California at San Diego (UCSD), La Jolla, San Diego, California, USA

    J. Warner

    University of Oxford, Oxford, UK

    A.S. Weiss

    The University of Sydney, Sydney, New South Wales, Australia

    J. Yuan

    Stockholms Universitet, Stockholm, Sweden

    G. Yushin

    Georgia Institute of Technology, Atlanta, Georgia, USA

    R. Zboril

    Palacky University, Olomouc, Czech Republic

    H. Zhang

    Nanyang Technological University, Singapore, Singapore

    X. Zhang

    Wuhan University, China

    Z. Zhang

    Zhejiang University, Hangzhou, China

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