期刊名称:CURRENT OPINION IN CHEMICAL ENGINEERING

ISSN:2211-3398
出版频率:Quarterly
出版社:ELSEVIER SCI LTD, THE BOULEVARD, LANGFORD LANE, KIDLINGTON, OXFORD, ENGLAND, OXON, OX5 1GB
  出版社网址:http://www.elsevier.com/
期刊网址:http://www.journals.elsevier.com/current-opinion-in-chemical-engineering/
影响因子:5.163
主题范畴:BIOTECHNOLOGY & APPLIED MICROBIOLOGY;    ENGINEERING, CHEMICAL
变更情况:

期刊简介(About the journal)    投稿须知(Instructions to Authors)    编辑部信息(Editorial Board)   



About the journal

Current Opinion in Chemical Engineering

Current Opinion in Chemical Engineering is devoted to bringing forth short and focused review articles written by experts on current advances in different areas of chemical engineering. Only invited review articles will be published.

The goals of each review article in Current Opinion in Chemical Engineering are:
1. To acquaint the reader/researcher with the most important recent papers in the given topic.
2. To provide the reader with the views/opinions of the expert in each topic.

The reviews are short (about 2500 words or 5-10 printed pages with figures) and serve as an invaluable source of information for researchers, teachers, professionals and students. The reviews also aim to stimulate exchange of ideas among experts.

Themed sections:
Each review will focus on particular aspects of one of the following themed sections of chemical engineering:
1. Nanotechnology
2. Energy and environmental engineering
3. Biotechnology and bioprocess engineering
4. Biological engineering (covering tissue engineering...


Instructions to Authors
2211-3398.pdf

Editorial Board

Editor-in-Chief

Professor K.K. Sirkar

Dept. of Chemical Engineering, New Jersey Institute of Technology


Section Editors

Vilas Pol

Purdue University, West Lafayette, Indiana, USA


Biological Engineering

K. Konstantopoulos

Johns Hopkins University, Baltimore, Maryland, USA

V.G. Pol

Purdue University, West Lafayette, Indiana, USA


Energy and Environmental Enginering

R. Agrawal

Purdue University, West Lafayette, Indiana, USA

V.I. Manousiouthakis

University of California, Los Angeles, California, USA

V.G. Pol

Purdue University, West Lafayette, Indiana, USA


Materials Engineering

T. Kyu

University of Akron, Akron, Ohio, USA

V.G. Pol

Purdue University, West Lafayette, Indiana, USA

J.A. Sekhar

University of Cincinnati, Cincinnati, Ohio, USA


Nanotechnology

V.G. Pol

Purdue University, West Lafayette, Indiana, USA

H. Yang

University of Illinois at Urbana-Champaign, Urbana, Illinois, USA

H.C. Zeng

National University of Singapore, Singapore


Process Systems Engineering

M. El-Halwagi

Texas A&M University, College Station, Texas, USA

K.M Ng

Hong Kong University of Science & Technology, Hong Kong, China

V.G. Pol

Purdue University, West Lafayette, Indiana, USA


Reaction Engineering and Catalysis

M.O. Coppens

University College London (UCL), London, England, UK

V.G. Pol

Purdue University, West Lafayette, Indiana, USA

T. Tsotsis

University of Southern California, Los Angeles, California, USA


Separation Engineering

W.S. Ho

Ohio State University, Columbus, Ohio, USA

K. Li

Imperial College London, London, UK

V.G. Pol

Purdue University, West Lafayette, Indiana, USA


Editorial Board

R. Agrawal

R. Agrawal

Purdue University, West Lafayette, Indiana, USA

A.T. Bell

A.T. Bell

University of California at Berkeley, Berkeley, California, USA

N.T.-S. Chung

N.T.-S. Chung

National University of Singapore, Singapore

Z.F. Cui

University of Oxford, Oxford, UK

M. Flytzani-Stephanopoulos

M. Flytzani-Stephanopoulos

Tufts University, Medford, Massachusetts, USA

F. Friedler

University of Pannonia, Veszprem, Hungary

R. Gani

Danmarks Tekniske Universitet (DTU), Lyngby, Denmark

R. Hernandez

University of Louisiana at Lafayette, Lafayette, Louisiana, USA

W.S. Ho

Ohio State University, Columbus, Ohio, USA

W.-S. Hu

W.-S. Hu

University of Minnesota, Minneapolis, Minnesota, USA

D.M. Kalyon

D.M. Kalyon

Stevens Institute of Technology, Hoboken, New Jersey, USA

B. Khusid

B. Khusid

New Jersey Institute of Technology, Newark, New Jersey, USA

R.S. Langer

R.S. Langer

Massachusetts Institute of Technology, Cambridge, Massachusetts, USA

K. Li

K. Li

Imperial College London, London, UK

J.C. Liao

J.C. Liao

University of California at Los Angeles, Los Angeles, California, USA

G. B. Marin

Universiteit Gent, Ghent, Belgium

RWTH Aachen University (RWTH), Aachen, Germany

J.H. Meldon

Tufts University, Medford, Massachusetts, USA

R.D. Noble

University of Colorado, Boulder, Colorado, USA

L.G. Papageorgiou

University College London (UCL), London, England, UK

E.T. Papoutsakis

University of Delaware, Newark, Delaware, USA

D.R. Paul

University of Texas at Austin, Austin, Texas, USA

N.A. Peppas

N.A. Peppas

University of Texas at Austin, Austin, Texas, USA

S.E. Pratsinis

S.E. Pratsinis

Eidgenössische Technische Hochschule (ETH) Zürich, Zürich, Switzerland

D. Ramkrishna

D. Ramkrishna

Purdue University, West Lafayette, Indiana, USA

T.P. Russell

T.P. Russell

University of Massachusetts at Amherst, Amherst, Massachusetts, USA

J.C. Schouten

J.C. Schouten

Technische Universiteit Eindhoven, Eindhoven, Netherlands

S. Sikdar

S. Sikdar

National Risk Management Research Laboratory, Cincinnati, Ohio, USA

G.N. Stephanopoulos

G.N. Stephanopoulos

Massachusetts Institute of Technology, Cambridge, Massachusetts, USA

C. Tien

C. Tien

Syracuse University, Syracuse, New York, USA

T. Tsotsis

T. Tsotsis

University of Southern California, Los Angeles, California, USA

N. Wagner

University of Delaware, Newark, Delaware, USA

R.T. Yang

University of Michigan, Ann Arbor, Michigan, USA

M. Yoshikawa

Kyoto Institute of Technology, Kyoto, Japan

H.C. Zeng

H.C. Zeng

National University of Singapore, Singapore

A.L. Zydney

A.L. Zydney

Pennsylvania State University, University Park, Pennsylvania, USA


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