期刊名称：ENTERPRISE INFORMATION SYSTEMS
 期刊简介(About the journal)
投稿须知(Instructions to Authors)
编辑部信息(Editorial Board)
About the journal
As the topic of Enterprise Information Systems (EIS) has an important strategic impact on global business and the world economy, there is a growing demand for research to provide insights into challenges, issues, and solutions related to the design, implementation and management of EIS. To respond the market needs from both academic researchers and practitioners for communicating and publishing their research outcomes, Taylor & Francis is launching Enterprise Information Systems.
Published four times a year, the Journal focuses on both the technical and application aspects of enterprise information systems technology, and the complex and cross-disciplinary problems of enterprise integration that arise in integrating extended enterprises in a contemporary global supply chain environment. Techniques developed in mathematical science, computer science, manufacturing engineering, operations management used in the design or operation of enterprise information systems will also be considered.
Specific topics of interest include, but are not limited to:
Enterprise information systems' design, application, implementation, and impacts in a variety of industrial sectors including manufacturing, service, healthcare, and government
Enterprise information systems and e-logistics, global e-supply chain management, supplier relationship management (SRM), customer relationship management (CRM)
Enterprise Resource Planning (ERP)
Business process and workflow modelling, analysis, integration, monitoring, and management
Enterprise modelling and integration, enterprise engineering
Enterprise computing concepts for specific domains such as electronic and mobile commerce, vertical domains such as finance, telecommunications, automotive, aerospace, command and control, defence, healthcare, and government
Inter-enterprise collaboration and virtual enterprises
Enterprise architecture design and modelling, model-driven architecture (MDA), component-oriented architecture, service-oriented architecture (SOA), collaborative development and co-operative engineering
Integration of (legacy) enterprise applications and information, integrated systems, e-factories, integrated manufacturing systems, industrial informatics
Evolution and management of enterprise computing systems
Realization technologies for enterprise computing, including ontologies and semantic web support, middleware standards and systems, such as CORBA and J2EE, modelling and description languages, such as XML, RDF, OWL, and UML
Enterprise computing tools
Business intelligence and knowledge management in enterprise information systems
Trust, security, and privacy issues in enterprise computing
Quality assurance issues in enterprise computing
Enterprise modelling and simulation
Systems research, systems engineering and enterprise information systems
Future generation enterprise information systems
Applications, case studies, and management issues
Written specifically for and by academic researchers and practitioners of EIS, the Journal provides in-depth coverage of cutting-edge research and applications issues in the area of EIS. The Journal is committed to publishing refereed research papers and review papers that contribute to the advancement of knowledge in EIS.
All published research articles in this journal have undergone rigorous peer review, based on initial editor screening and anonymous refereeing by independent expert referees.
Enterprise Information Systems is abstracted and indexed by: ACM Guide to Computing Literature; British Library Inside; Cambridge Scientific Abstracts; Compendex; EBSCO Databases; Engineering Index; Inspec; International Bibliography of the Social Sciences; ISI Current Contents, Engineering, Computing and Technology; ISI Science Citation Index; ProQuest; Scopus; and Cabell's Directory.
Instructions to Authors
This journal uses ScholarOne Manuscripts (previously Manuscript Central) to peer review manuscript submissions. Please read the guide for ScholarOne authors before making a submission. Complete guidelines for preparing and submitting your manuscript to this journal are provided below.
The instructions below are specifically directed at authors that wish to submit a manuscript to Enterprise Information System. For general information, please visit the Publish With Us section of our website.
Enterprise Information System considers all manuscripts on the strict condition that they have been submitted only to Enterprise Information System, that they have not been published already, nor are they under consideration for publication or in press elsewhere. Authors who fail to adhere to this condition will be charged with all costs which Enterprise Information System incurs and their papers will not be published.
Contributions to Enterprise Information System must report original research and will be subjected to review by referees at the discretion of the Editorial Office.
Manuscript preparation
1. General guidelines
Papers are accepted only in English. British English spelling and punctuation is preferred.
There is no formal limit on the length of research articles or reviews, but short communications should be limited to a maximum of 2000 words.
Manuscripts should be compiled in the following order: title page; abstract; keywords; main text; acknowledgments; appendixes (as appropriate); references; table(s) with caption(s) (on individual sheets); figure caption(s) (as a list).
Abstracts of 200 words are required for all papers submitted.
Each paper should have five to ten keywords.
Section headings should be concise and numbered sequentially, using a decimal system for subsections.
All the authors of a paper should include their full names, affiliations, postal addresses, telephone and fax numbers and email addresses on the cover page of the manuscript. One author should be identified as the Corresponding Author.
Biographical notes on contributors are not required for this journal.
For all manuscripts non-discriminatory language is mandatory. Sexist or racist terms should not be used.
Authors must adhere to SI units. Units are not italicised.
When using a word which is or is asserted to be a proprietary term or trade mark, authors must use the symbol ® or TM.
2. Style guidelines
Description of the Journal's article style, Quick guide
Description of the Journal's reference styles
Guide to using mathematical symbols and equations
LaTeX template (Please save the LaTeX template to your hard drive and open it for use as a template from the directory to which it was saved)
Word templates are available for this journal. If you are not able to use the template via the links or if you have any other queries, please contact authortemplate@tandf.co.uk
3. Figures
It is in the author's interest to provide the highest quality figure format possible. Please be sure that all imported scanned material is scanned at the appropriate resolution: 1200 dpi for line art, 600 dpi for grayscale and 300 dpi for colour.
Figures must be saved separate to text. Please do not embed figures in the paper file.
Files should be saved as one of the following formats: TIFF (tagged image file format), PostScript or EPS (encapsulated PostScript), and should contain all the necessary font information and the source file of the application (e.g. CorelDraw/Mac, CorelDraw/PC).
All figures must be numbered in the order in which they appear in the paper (e.g. figure 1, figure 2). In multi-part figures, each part should be labelled (e.g. figure 1(a), figure 1(b)).
Figure captions must be saved separately, as part of the file containing the complete text of the paper, and numbered correspondingly.
The filename for a graphic should be descriptive of the graphic, e.g. Figure1, Figure2a.
4. Colour
The Journal has no free colour pages within its annual page allowance. Authors of accepted papers who propose publishing figures in colour in the print version should consult Taylor & Francis at proof stage to agree a financial contribution to colour reproduction costs. Figures that appear in black-and-white in the print edition of the Journal will appear in colour in the online edition, assuming colour originals are supplied.
5. Reproduction of copyright material
As an author, you are required to secure permission if you want to reproduce any figure, table, or extract from the text of another source. This applies to direct reproduction as well as "derivative reproduction" (where you have created a new figure or table which derives substantially from a copyrighted source). Authors are themselves responsible for the payment of any permission fees required by the copyright owner. Copies of permission letters should be sent with the manuscript upon submission to the Editor(s).For further information and FAQs, please see http://journalauthors.tandf.co.uk/preparation/permission.asp.
Copyright permission letter template
6. Supplementary online material
Authors are welcome to submit animations, movie files, sound files or any additional information for online publication.
Information about supplementary online material
Manuscript submission
All submissions should be made online at the Enterprise Information Systems Manuscript Central site. New users should first create an account. Once logged on to the site, submissions should be made via the Author Centre. Online user guides and access to a helpdesk are available on this website.
Authors should prepare and upload two versions of their manuscript. One should be a complete text, while in the second all document information identifying the author should be removed from files to allow them to be sent anonymously to referees. When uploading files authors will then be able to define the non-anonymous version as "File not for review".
Manuscripts may be submitted in any standard format, including Word, PostScript and PDF. These files will be automatically converted into a PDF file for the review process. LaTeX files should be converted to PDF prior to submission because Manuscript Central is not able to convert LaTeX files into PDFs directly.
Copyright and authors' rights
It is a condition of publication that authors vest or license copyright in their articles, including abstracts, in Taylor & Francis Ltd. This enables us to ensure full copyright protection and to disseminate the article, and the Journal, to the widest possible readership in print and electronic formats as appropriate. Authors may, of course, use the material elsewhere after publication providing that prior permission is obtained from Taylor & Francis Ltd.
Exceptions are made for authors of Crown or US Government employees whose policies require that copyright cannot be transferred to other parties. We ask that a signed statement to this effect is submitted when returning proofs for accepted papers.
Further details and FAQs on Taylor & Francis's policy on copyright and authors' rights
Reprints
Corresponding authors will receive free online access to their article through our website (www.informaworld.com). Reprints of articles published in the Journal can be purchased through Rightslink® when proofs are received. If you have any queries, please contact our reprints department at reprints@tandf.co.uk.
Page charges
There are no page charges to individuals or institutions.
Editorial Board
Editor-in-Chief
Li Xu - Old Dominion University, Norfolk, USA
Associate Editors
Rogério Atem de Carvalho - Fluminense Federal Institute, Campos, Brazil
Sohail S. Chaudhry - Villanova University, Villanova, USA
Maria Pia Fanti - Polytechnic of Bari, Bari, Italy
Juhnyoung Lee - IBM T.J. Watson Research Center, Hawthorne, USA
Ling Li - Old Dominion University, Norfolk, USA
A Min Tjoa - Vienna University of Technology, Vienna, Austria
François Vernadat - European Court of Auditors, Luxembourg & University of Metz, France
Chengen Wang - Northeastern University, Shenyang, China
Chris Zhang - University of Saskatchewan, Saskatoon, Canada
Editorial Advisory Board
Elias Awad - University of Virginia, Charlottesville, USA
Yiling Chen - Harvard University, Cambridge, USA
Nelson Fraiman - Columbia University, New York, USA
Junichi Iijima - Tokyo Institute of Technology, Tokyo, Japan
Leonid Kalinichenko - Russian Academy of Sciences, Moscow, Russia
Gary Koehler - University of Florida, Gainesville, USA
Ramayya Krishnan - Carnegie Mellon University, Pittsburgh, USA
Allen Lee - Virginia Commonwealth University, Richmond, USA
Huaizu Li - University of Alberta, Edmonton, Canada
Yuan Li - Shanghai Jiaotong University, Shanghai, China
Kai Mertins - Fraunhofer Institute for Production Systems and Design Technology, Berlin, Germany
Hasan Pirkul - University of Texas, Dallas, USA
Paolo Quattrone - IE Business School, Madrid, Spain
Sartaj Sahni - University of Florida, Gainesville, USA
Roman Slowinski - Poznan University of Technology, Poznan, Poland
Edison Tse - Stanford University, Stanford, USA
Ricardo Valerdi - Massachusetts Institute of Technology, Cambridge, USA
Yingluo Wang - Chinese Academy of Engineering, Beijing, China
John N. Warfield - George Mason University, Fairfax, USA
Shoubo Xu - Chinese Academy of Engineering, Beijing, China
Editorial Board
Anurag Agarwal - University of South Florida, Sarasota, USA
Olga Andreichicova - Moscow Institute of Physics and Technology, Moscow, Russia
Juan Carlos Augusto - University of Ulster, Newtownabbey, UK
Valérie Botta-Genoulaz - National Institute of Applied Science, Lyon, France
Philip Chen - University of Texas, San Antonio, USA
L. K. Chu - University of Hong Kong, Hong Kong, China
Dov Dori - Israel Institute of Technology, Haifa, Israel and Massachusetts Institute of Technology, Cambridge, USA
Yushun Fan - Tsinghua University, Beijing, China
Guido Geerts - University of Delaware, Newark, USA
Bee Hua Goh - National University of Singapore, Singapore
Jon Atle Gulla - Norwegian University of Science and Technology, Trondheim, Norway
Jingzhi Guo - University of Macau, Macau
Lenny Koh - University of Sheffield, Sheffield, UK
Andrew Kusiak - University of Iowa, Iowa City, USA
Yanping Liu - Beijing Jiaotong University, Beijing, China
William McCarthy - Michigan State University, East Lansing, USA
Charles Møller - Centre for Industrial Production, Aalborg University, Denmark
Daniel O'Leary - University of Southern California, Los Angeles, USA
David Olson - University of Nebraska, Lincoln, USA
Maria Raffai - Szechenyi University, Gyor, Hungary
Ram Ramesh - State University of New York, Buffalo, USA
Isabel Ramos - University of Minho, Guimarães, Portugal
Rami Rifaieh - University of California, San Diego, USA
Michael Rosemann - Queensland University of Technology, Brisbane, Australia
Francisco Ruiz - University of Castilla-La Mancha, Ciudad Real, Spain
Linda Salchenberger - Marquette University, Milwaukee, USA
Radhika Santhanam - University of Kentucky, Lexington, USA
Susan Scott - London School of Economics, London, UK
Marten J. van Sinderen - University of Twente, Enschede, Netherlands
Wenan Tan - Shanghai Second Polytechnic University, Shanghai, China
Gottfried Vossen - University of Muenster, Muenster, Germany
Kanliang Wang - Renmin University of China, China
Chihiro Watanabe - Tokyo Institute of Technology, Tokyo, Japan
Meng Chu Zhou - New Jersey Institute of Technology, Newark, USA
| 
