期刊名称：JOURNAL OF LASER MICRO NANOENGINEERING ISSN： 1880-0688 出版频率： Tri-annual 出版社： JAPAN LASER PROCESSING SOC, OSAKA UNIV, 11-1 MIHOGAOKA, IBARAKI C/O KATAYAMA LAB, JOINING & WELDING RES INST, OSAKA, JAPAN, 567-0047   出版社网址： http://www.jlps.gr.jp/jlmn/index.php 期刊网址： http://www.jlps.gr.jp/jlmn/index.php 影响因子： 1.277 主题范畴： NANOSCIENCE & NANOTECHNOLOGY;    MATERIALS SCIENCE, MULTIDISCIPLINARY;    OPTICS;    PHYSICS, APPLIED 期刊简介(About the journal)    投稿须知(Instructions to Authors)    编辑部信息(Editorial Board)    About the journal Journal of Laser Micro/Nanoengineering, founded in 2005 by Japan Laser Processing Society (JLPS), is an international online journal for the rapid publication of experimental and theoretical investigations in laser-based technology for micro- and nano-engineering. Access to the full article is provided free of charge. JLMN publishes regular articles, technical communications, and invited papers about new results related to laser-based technology for micro and nano engineering. The articles oriented to industrial developments with interesting technical information may be considered as technical communications. In addition to regular articles and technical communications, review papers are invited by the editorial board as invited papers. The submitted manuscript must have been neither copyrighted, classified, published, nor be being considered for publication elsewhere except for LPM proceedings. The authors can submit a manuscript to this Journal anytime. In addition, the authors who submit their proceedings manuscripts for LPM symposium organized by JLPS have a chance to publish them in this Journal. The submitted manuscripts are peer reviewed. Once a manuscript has been accepted, it is published online at URL of http://www.jlps.gr.jp/jlmn/ quickly and free of charge. Instructions to Authors Submission of manuscript Original manuscripts should be submitted to the following address, along with a CD that includes both PDF and Microsoft Word files of their papers by post or business mail. Each manuscript must be accompanied by a completed and signed copyright transfer statement. (Copyright Transfer Form: PDF) Sending Address: Journal of Laser Micro/Nanoengineering 11-1 Mihogaoka, Ibaraki, Osaka, 567-0047, Japan c/o Katayama Lab., JWRI-Joining and Welding Research Institute, Osaka University Attn: Hiromi Inoue (TEL/FAX: +81-6-6879-8642, E-mail: jlmn jlps.gr.jp) Manuscripts sent to authors for revision should be returned to the above address within three months after revisions based on the reviewer's comments. A manuscript returned after this period will generally be regarded as newly submitted and will receive a new receipt date. Suggestion of possible reviewers The authors can suggest possible reviewers. To help protect the reviewer's anonymity, the authors must nominate at least three names, with full information on postal and e-mail addresses, telephone number, and fax number. The reviewer may, of course, not be selected from the list. How to prepare your manuscript The instruction manual and template can be downloaded. (Instruction Manual: PDF, WORD) Editorial Board Editor-in-Chief K. Sugioka (RIKEN - The Institute of Physical and Chemical Research, Japan) E-mail: ksugioka postman.riken.jp Editors C. B. Arnold (Princeton Univ., USA) Y. Cheng (Shanghai Institute of Optics and Fine Mechanics, CAS, China) F. Dausinger (Dausinger + Giesen GmbH, Germany) G. Dearden (Univ. of Liverpool, UK) J. J. Dubowski (Universite de Sherbrooke, Canada) H. Helvajian (The Aerospace Corporation, USA) M.H. Hong (National Univ. of Singapore + Data Storage Institute, Singapore) S. Katayama (Osaka Univ., Japan) T. Lippert (Paul Scherrer Institut, Switzerland) S. Matsuo (Univ. of Tokushima, Japan) M. Meunier (Ecole Polytechnique de Montreal, Canada) H. Niino (AIST-National Institute of Advanced Science and Technology, Japan) M. Okoshi (National Defense Academy, Japan) T. Ooie (AIST-National Institute of Advanced Science and Technology, Japan) A. Ostendorf (Ruhr-University Bochum, Germany) A. Pique (Naval Research Laboratory, USA) R. Stoian (Universite Jean MONNET, France) V. Veiko (St. Petersburg State Univ. of Information Technologies, Russia) K. Washio (Paradigm Laser Research Ltd., Japan) W. Watanabe (AIST-National Institute of Advanced Science and Technology, Japan)